Lab Equipment     Spin coater "Chemat"

 

Spin coating is used for many applications where relatively flat substrates or objects are coated with thin layers of material. The material to be made into the coating must be dissolved or dispersed into a solvent of some kind and this coating solution is then deposited onto the surface and spun-off to leave a uniform layer for subsequent processing stages and ultimate use. Some technologies that depend heavily on high quality spin coated layers are: (1) Photoresist for defining patterns in microcircuit fabrication; (2) Dielectric/insulating layers for microcircuit fabrication, e.g. SOG, SiLK, etc, (3) Magnetic disk coatings - magnetic particle suspensions, head lubricants, etc., (4) Flat screen display coatings. - Antireflection coatings, conductive oxide, etc., (5) Compact Disks DVD, CD ROM, etc., (6) Television tube phosphor and antireflection coatings.

 

KW-4A is a compact and easy-to-use spin coater for precise and uniform deposition of thin films and coatings. Its rugged, vibration-free and portable design makes it a versatile tool for your research facility. A two-stage spin process allows dispensing at low speed and homogenizing the coating at high speed. The KW-4A spin coater can be used to deposit metal oxide thin films, polymer coatings and metal organic thin films

KW-4A Spin Coater

2-Stage Spinning: Vacuum > 2.1 CFM

Stage 1: 500-2500 rpm; 2-18 seconds

Stage 2: 800-8,000 rpm; 3-60 seconds

 

 

 

 

 

KW-4AH hotplate best accompanied with KW-4A spin coater is a compact and easy-to-use hotplate for baking and curing thin films and coatings. Its rugged, portable design, and temperature uniformity make it a versatile tool for all types of research facilities. In conjunction with the KW-4A spin coater, the system can be used to fabricate metal oxide thin films, polymer coatings and metal organic thin films

KW-4AH HOt Plate

Use hotplate to cure thin film

Operation Manual Load Process Control Program Temperature Resolution 1°C Temperature Range 50-350°C Substrate Size 6 inch

 

 

 

 

 

 

 

 

KW-4AD Dispenser best accompanied with KW-4A spin coater is a compact and easy-to-use dispenser for precisely dispensing spin-on liquid onto the substrate to obtain uniform deposition of thin films and coatings. Its use of syringes allows easy change of dispensing liquids without tedious cleaning, eliminates potential contamination from other solutions. These features enable the quick formulation and optimization work, thus makes it a powerful tool for your research. In conjunction with KW-4A spin coater, the system can be used to deposit varieties of coatings and films

KW-4AC UV Curer

KW-4AUV is specially designed for curing photosensitive coatings and thin films. It equips two UV light sources with radiations at 365 nm and 245 nm. The coated substrates up to 6" diameter will be rotated at 6 rpm to ensure uniform curing.

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KW-4AC UV curing best accompanied with KW-4A spin coater is a photochemical process by which monomers undergo curing (polymerization or cross inking) upon exposure to ultraviolet radiation. A specially formulated monomer will polymerize when exposed to ultraviolet radiation. This UV "curable" monomer includes a sensitizer which absorbs UV energy and initiates a polymerizing reaction in the monomer.In conjunction with the KW-4A spin coater, the system can be used to make various coatings and thin films via the photochemical process.

KW-4ACD Dispensor

Precisely dispensing spin-on liquid onto the substrate to obtain uniform deposition of thin films and coatings.

With 0-80psi Dispensing Time 0-10 s Air Input 80-100psi

 

 

 

 

 

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National Direct Network Co., Ltd.
240 Soi Petchkasem 63/4 Petchkasem Road, Bangkae, Bangkae, Bangkok, Thailand 10160
Tel : 02 4444-655 Fax: 02 4444-650 email : sales@ndn.co.th